Ghi line在PTT/mobile01評價與討論，在ptt社群跟網路上大家這樣說

Ghi line在Exposure of Photoresists - MicroChemicals

Broadband resists also absorb the g- (435 nm) and h- (405 nm) lines, but can also be exposed monochromatically within their spectral sensitivity. Deep-UV ...

Ghi line在ghi line波長 - 軟體兄弟

ghi line 波長,g p. ) •敘述晶圓在步進機整合系統(track-stepper integrated system)中的移動方式. •說明解析度(resolution)和景深(depth of focus)、.

Ghi line在GHI Electronics Product Line | Mouser 臺灣

GHI Electronics products are available at Mouser Electronics. Check inventory, pricing, & datasheets for GHI Electronics products at Mouser.

Ghi line在Photolithography - Wikipedia

From the early 1960s through the mid-1980s, Hg lamps had been used in lithography for their spectral lines at 436 nm ("g-line"), 405 nm ("h-line") and 365 nm (" ...

Ghi line在酚醛樹脂材料發展與IC製程光阻應用 - 材料世界網

... 自有的半導體製程用光阻劑技術，即採用酚醛樹脂系列，搭配自有的正型感光物材料技術，成功開發出g-line (436 nm)與i-line (365 nm)兩款正型光阻 ...

Ghi line在黃光&橘光玻璃 - ULIA-維妙實業有限公司

早期曝光機的光源為全光譜光源，後演進到G-line(436nm)光源，目前最廣泛使用的為I-line(365nm)光源，對於0.3μm線寬以下的IC製程，則須採用深紫外線(deep UV)248nm ...

Ghi line在「ghi line」的圖片搜尋結果

Ghi line在Ch 6: Lithography

所應用的. 圖形尺寸. (μm). G-line. 436. 0.50. 水銀燈. H-line. 405. I-line. 365. 0.35 to. 0.25. XeF. 351. XeCl. 308. 準分子雷. 射. KrF. (DUV). 248. 0.25 to.

Ghi line在半導體用光阻劑之發展概況

依曝光的光源不同，光源可區分為紫外線(UV)、深紫外線(Deep UV；DUV)和超紫外線(Extreme UV；EUV)三種。和紫外線搭配的為g-line(436nm)和i-line(365nm)光 ...